Surface energy control techniques for photomask fabrication and their characterizations with scanning probe microscopy

Masaaki Kurihara; Sho Hatakeyama; Kouji Yoshida; Makoto Abe; Daisuke Totsukawa; Yasutaka Morikawa; Hiroshi Mohri; Naoya Hayashi

doi:10.1117/12.793099

19 May 2008 Surface energy control techniques for photomask fabrication and their characterizations with scanning probe microscopy

Masaaki Kurihara, Sho Hatakeyama, Kouji Yoshida, Makoto Abe, Daisuke Totsukawa, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi

Author Affiliations +

Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 70282T (2008) https://doi.org/10.1117/12.793099
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan

Abstract

Most of photomask issues such as pattern collapse, HAZE, and cleaning damage relate to behavior of mask surfaces. Therefore it is coming to be important to control surface energy in photomask processes. Especially adhesion analysis in micro region is strongly desired to optimize material and process designs in photomask fabrication. Quantitative measurements of adhesive forces of resists on photomask blanks were realized with scanning probe microscopy (SPM) techniques. Then surface energy on photomask blanks was able to be controlled by modification with some silanization reagents. In addition, adhesive forces of resists on surfaces modified with some silanes were able to be also controlled. The SPM method is proved to be effective for measuring adhesive energy of micro patterns on photomask blanks.

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Masaaki Kurihara, Sho Hatakeyama, Kouji Yoshida, Makoto Abe, Daisuke Totsukawa, Yasutaka Morikawa, Hiroshi Mohri, and Naoya Hayashi "Surface energy control techniques for photomask fabrication and their characterizations with scanning probe microscopy", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282T (19 May 2008); https://doi.org/10.1117/12.793099

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