Alternative technology for double patterning process simplification

Hee-Youl Lim; Kyo-Young Jang; Jae-Heon Kim; Sung-Gu Lee; Sarohan Park; Tae-Hwan Kim; Cheol-Kyu Bok; Seung-Chan Moon

doi:10.1117/12.804657

4 December 2008 Alternative technology for double patterning process simplification

Hee-Youl Lim, Kyo-Young Jang, Jae-Heon Kim, Sung-Gu Lee, Sarohan Park, Tae-Hwan Kim, Cheol-Kyu Bok, Seung-Chan Moon

Proceedings Volume 7140, Lithography Asia 2008; 714020 (2008) https://doi.org/10.1117/12.804657
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan

Abstract

In this paper, we will present experimental results on sub-40nm node patterning of DRAM and some technical issues for capping freezing in simplified double patterning lithography. Lithography resolution limit of single pattern is 40nm in ArF immersion process. For sub-40nm patterning, we have to use double patterning lithography or EUV process. But, double patterning lithography process is very complicated and expensive solution. And EUV volume production technology will be not ready until 2012. Therefore, we have tried a simplified double patterning lithography.

Citation Download Citation

Hee-Youl Lim, Kyo-Young Jang, Jae-Heon Kim, Sung-Gu Lee, Sarohan Park, Tae-Hwan Kim, Cheol-Kyu Bok, and Seung-Chan Moon "Alternative technology for double patterning process simplification", Proc. SPIE 7140, Lithography Asia 2008, 714020 (4 December 2008); https://doi.org/10.1117/12.804657

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available