Interference assisted lithography for patterning of 1D gridded design

Robert T. Greenway; Rudolf Hendel; Kwangok Jeong; Andrew B. Kahng; John S. Petersen; Zhilong Rao; Michael C. Smayling

doi:10.1117/12.812033

18 March 2009 Interference assisted lithography for patterning of 1D gridded design

Robert T. Greenway, Rudolf Hendel, Kwangok Jeong, Andrew B. Kahng, John S. Petersen, Zhilong Rao, Michael C. Smayling

Proceedings Volume 7271, Alternative Lithographic Technologies; 72712U (2009) https://doi.org/10.1117/12.812033
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

We present Interference Assisted Lithography (IAL) as a promising and cost-effective solution for extending lithography. IAL achieves a final pattern by combining an interference exposure with a trim exposure. The implementation of IAL requires that today's 2D random layouts be converted to highly regular 1D gridded designs. We show that an IAL-friendly 6T SRAM bitcell can be designed following 1D gridded design rules and that the electrical characteristics is comparable to today's 2D design. Lithography simulations confirm that the proposed bitcell can be successfully imaged with IAL.

Citation Download Citation

Robert T. Greenway, Rudolf Hendel, Kwangok Jeong, Andrew B. Kahng, John S. Petersen, Zhilong Rao, and Michael C. Smayling "Interference assisted lithography for patterning of 1D gridded design", Proc. SPIE 7271, Alternative Lithographic Technologies, 72712U (18 March 2009); https://doi.org/10.1117/12.812033

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