Paper
18 March 2009 Debris characteristics and mitigation of a laser plasma tin-contained liquid jet/droplet targets
Author Affiliations +
Abstract
We realized a laser-plasma EUV target, which satisfied the high EUV CE and the debris suppression simultaneously by using low-concentration liquid jet/droplet targets containing tin oxides and chlorides. Plasma regulation by double pulse irradiation improved the EUV CE. In terms of the debris emissions, we reduced the amount of the deposited tin oxide by applying in situ heat and high-energy photons onto a witness plate. These active debris suppression resulted in the decrease of the deposition rate and deoxidation of the debris, respectively. The use of tin chloride liquid target also realized a well-balanced debris behavior, where deposited debris was cleaned by chlorine atoms or ions, resulting in an approximately zero deposition rate.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masanori Kaku, Shunsuke Touge, Masahito Katto, and Shoichi Kubodera "Debris characteristics and mitigation of a laser plasma tin-contained liquid jet/droplet targets", Proc. SPIE 7271, Alternative Lithographic Technologies, 727132 (18 March 2009); https://doi.org/10.1117/12.813479
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Cited by 1 scholarly publication.
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KEYWORDS
Tin

Extreme ultraviolet

Ions

Plasma

Pulsed laser operation

Silicon

Vacuum ultraviolet

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