RLS tradeoff vs. quantum yield of high PAG EUV resists

Craig Higgins; Alin Antohe; Greg Denbeaux; Seth Kruger; Jacque Georger; Robert Brainard

doi:10.1117/12.814307

18 March 2009 RLS tradeoff vs. quantum yield of high PAG EUV resists

Craig Higgins, Alin Antohe, Greg Denbeaux, Seth Kruger, Jacque Georger, Robert Brainard

Proceedings Volume 7271, Alternative Lithographic Technologies; 727147 (2009) https://doi.org/10.1117/12.814307
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

The effect of higher film quantum yields (FQYs) on the resolution, line-edge roughness, and sensitivity (RLS) tradeoff was evaluated for extreme ultraviolet (EUV, 13.5 nm) photoresists. We determined the FQY of increasingly high levels of an iodonium photoacid generator (PAG) using two acid detection methods. First, base titration methods were used to determine C-parameters for acid generation, and second, an acid-sensitive dye (Coumarin-6) was used to determine the amount of acid generated and ultimately, to determine absorbance and FQYs for both acid detection methods. The RLS performance of photoresists containing increasing levels of PAG up to ultrahigh loadings (5-40 wt% PAG) was evaluated. RLS was characterized using two methods: • K_LUP resist performance •Z-Parameter (Z = LER²*Esize*Resolution³)

Citation Download Citation

Craig Higgins, Alin Antohe, Greg Denbeaux, Seth Kruger, Jacque Georger, and Robert Brainard "RLS tradeoff vs. quantum yield of high PAG EUV resists", Proc. SPIE 7271, Alternative Lithographic Technologies, 727147 (18 March 2009); https://doi.org/10.1117/12.814307

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