Proximity effect correction sensitivity analysis

Alex Zepka; Rainer Zimmermann

doi:10.1117/12.863710

15 May 2010 Proximity effect correction sensitivity analysis

Alex Zepka, Rainer Zimmermann

Proceedings Volume 7545, 26th European Mask and Lithography Conference; 75450E (2010) https://doi.org/10.1117/12.863710
Event: 26th European Mask and Lithography Conference, 2010, Grenoble, France

Abstract

Determining the quality of a proximity effect correction (PEC) is often done via 1-dimensional measurements such as: CD deviations from target, corner rounding, or line-end shortening. An alternative approach would compare the entire perimeter of the exposed shape and its original design. Unfortunately, this is not a viable solution as there is a practical limit to the number of metrology measurements that can be done in a reasonable amount of time. In this paper we make use of simulated results and introduce a method which may be considered complementary to the standard way of PEC qualification. It compares simulated contours with the target layout via a Boolean XOR operation with the area of the XOR differences providing a direct measure of how close a corrected layout approximates the target.

Citation Download Citation

Alex Zepka and Rainer Zimmermann "Proximity effect correction sensitivity analysis", Proc. SPIE 7545, 26th European Mask and Lithography Conference, 75450E (15 May 2010); https://doi.org/10.1117/12.863710

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