Laser-produced plasma light source for EUVL

Igor V. Fomenkov; Alex I. Ershov; William N. Partlo; David W. Myers; Richard L. Sandstrom; Norbert R. Böwering; Georgiy O. Vaschenko; Oleh V. Khodykin; Alexander N. Bykanov; Shailendra N. Srivastava; Imtiaz Ahmad; Chirag Rajyaguru; Daniel J. Golich; Silvia De Dea; Richard R. Hou; Kevin M. O'Brien; Wayne J. Dunstan; David C. Brandt

doi:10.1117/12.848408

22 March 2010 Laser-produced plasma light source for EUVL

Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, David W. Myers, Richard L. Sandstrom, Norbert R. Böwering, Georgiy O. Vaschenko, Oleh V. Khodykin, Alexander N. Bykanov, Shailendra N. Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel J. Golich, Silvia De Dea, Richard R. Hou, Kevin M. O'Brien, Wayne J. Dunstan, David C. Brandt

Author Affiliations +

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 763639 (2010) https://doi.org/10.1117/12.848408
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

This paper describes the development of laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source architecture for advanced lithography applications in high volume manufacturing. EUV lithography is expected to succeed 193nm immersion technology for sub-22nm critical layer patterning. In this paper we discuss the most recent results from high EUV power testing and debris mitigation testing on witness samples and normal incidence collectors. Subsystem performance will be shown including the CO2 drive laser, debris mitigation, normal incidence collector and coatings, droplet generation, laser-to-droplet targeting control, intermediate-focus (IF) metrology and system use and experience. In addition, a number of smaller lab-scale experimental systems have also been constructed and tested. This presentation reviews the experimental results obtained on systems with a focus on the topics most critical for an HVM source.

Citation Download Citation

Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, David W. Myers, Richard L. Sandstrom, Norbert R. Böwering, Georgiy O. Vaschenko, Oleh V. Khodykin, Alexander N. Bykanov, Shailendra N. Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel J. Golich, Silvia De Dea, Richard R. Hou, Kevin M. O'Brien, Wayne J. Dunstan, and David C. Brandt "Laser-produced plasma light source for EUVL", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763639 (22 March 2010); https://doi.org/10.1117/12.848408

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available