Influence of error distribution shape on process capability analysis

Masafumi Asano; Takahiro Ikeda

doi:10.1117/12.846471

1 April 2010 Influence of error distribution shape on process capability analysis

Masafumi Asano, Takahiro Ikeda

Proceedings Volume 7638, Metrology, Inspection, and Process Control for Microlithography XXIV; 763827 (2010) https://doi.org/10.1117/12.846471
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

In semiconductor manufacturing, process errors are likely to depart from normal distributions. For data violating the assumption of normality, classical process capability indices (PCIs) may be misleading in terms of the process behavior. To avoid this, we propose new PCIs with information on the skewness and the kurtosis of a given distribution. Based on a Monte Carlo simulation with various distributions, the formulae of the proposed PCIs were optimized. Compared with Johnson transformation or other approaches, our proposed method is simple in calculation. Therefore, it would have greater applicability for data analysis in semiconductor manufacturing.

Citation Download Citation

Masafumi Asano and Takahiro Ikeda "Influence of error distribution shape on process capability analysis", Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 763827 (1 April 2010); https://doi.org/10.1117/12.846471

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available