Demonstrating the benefits of template-based design-technology co-optimization

Lars Liebmann; Jason Hibbeler; Nathaniel Hieter; Larry Pileggi; Tejas Jhaveri; Matthew Moe; Vyacheslav Rovner

doi:10.1117/12.848244

2 April 2010 Demonstrating the benefits of template-based design-technology co-optimization

Lars Liebmann, Jason Hibbeler, Nathaniel Hieter, Larry Pileggi, Tejas Jhaveri, Matthew Moe, Vyacheslav Rovner

Proceedings Volume 7641, Design for Manufacturability through Design-Process Integration IV; 76410R (2010) https://doi.org/10.1117/12.848244
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

The concept of template-based design-technology co-optimization as a means of curbing escalating design complexity and increasing technology qualification risk is described. Data is presented highlighting the design efficacy of this proposal in terms of power, performance, and area benefits, quantifying the specific contributions of complex logic gates in this design optimization. Experimental results from 32nm technology node bulk CMOS wafers are presented to quantify the variability and design-margin reductions as well as yield and manufacturability improvements achievable with the proposed template-based design-technology co-optimization technique. The paper closes with data showing the predictable composability of individual templates, demonstrating a fundamental requirement of this proposal.

Citation Download Citation

Lars Liebmann, Jason Hibbeler, Nathaniel Hieter, Larry Pileggi, Tejas Jhaveri, Matthew Moe, and Vyacheslav Rovner "Demonstrating the benefits of template-based design-technology co-optimization", Proc. SPIE 7641, Design for Manufacturability through Design-Process Integration IV, 76410R (2 April 2010); https://doi.org/10.1117/12.848244

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