Designing DWDM multiplexers on SiON wafers

Laurentiu Dragnea

doi:10.1117/12.882195

3 December 2010 Designing DWDM multiplexers on SiON wafers

Laurentiu Dragnea

Proceedings Volume 7821, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies V; 78212I (2010) https://doi.org/10.1117/12.882195
Event: Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies, 2010, Constanta, Romania

Abstract

I propose an integrated multiplexer/demultiplexer that use a concave blazed diffraction grating on SiON wafer. The paper presents a technology that overcome existing issues regarding implementation of such a microoptic device. Two types of similar integrated systems were developed but both of them have not minimized chromatic, astigmatism and spherical aberrations. Both systems use gold coating for vertical walls of diffraction grating that has reflection index lower than aluminum for wavelength used. Technology proposed in this paper minimizes the chromatic, astigmatism and spherical aberrations. Also is used aluminum for coating of vertical walls of diffraction grating. SiON wafer is etched with Argon plasma through photoresist mask with thickness of 0,8 μm for grating configuration allowing reusing of the photoresist in next stage of coating. This makes possible that coating through liftoff to be aligned to vertical walls of concave diffraction grating, eliminating positioning errors due to coating mask.

Citation Download Citation

Laurentiu Dragnea "Designing DWDM multiplexers on SiON wafers", Proc. SPIE 7821, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies V, 78212I (3 December 2010); https://doi.org/10.1117/12.882195

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