Improvements in the EQ-10 electrodeless Z-pinch EUV source for metrology applications

Stephen F. Horne; Deborah Gustafson; Matthew J. Partlow; Matthew M. Besen; Donald K. Smith; Paul A. Blackborow

doi:10.1117/12.880794

8 April 2011 Improvements in the EQ-10 electrodeless Z-pinch EUV source for metrology applications

Stephen F. Horne, Deborah Gustafson, Matthew J. Partlow, Matthew M. Besen, Donald K. Smith, Paul A. Blackborow

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 79692Z (2011) https://doi.org/10.1117/12.880794
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Now that EUV lithography systems are beginning to ship into the fabs for next generation chips it is more critical that the EUV infrastructure developments are keeping pace. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinch™ light source since 2005. The source is currently being used for metrology, mask inspection, and resist development. These applications require especially stable performance in both power and source size. Over the last 5 years Energetiq has made many source modifications which have included better thermal management as well as high pulse rate operation6. Recently we have further increased the system power handling and electrical pulse reproducibility. The impact of these modifications on source performance will be reported.

Citation Download Citation

Stephen F. Horne, Deborah Gustafson, Matthew J. Partlow, Matthew M. Besen, Donald K. Smith, and Paul A. Blackborow "Improvements in the EQ-10 electrodeless Z-pinch EUV source for metrology applications", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692Z (8 April 2011); https://doi.org/10.1117/12.880794

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