Soft UV-NIL at the 12.5 nm scale

G. Kreindl; M. Kast; D. Treiblmayr; T. Glinsner; E. Platzgummer; H. Loeschner; P. Joechl; S. Eder-Kapl; T. Nartz; M. Muehlberger; I. Bergmair; M. Boehm; R. Schoeftner

doi:10.1117/12.870524

4 April 2011 Soft UV-NIL at the 12.5 nm scale

G. Kreindl, M. Kast, D. Treiblmayr, T. Glinsner, E. Platzgummer, H. Loeschner, P. Joechl, S. Eder-Kapl, T. Nartz, M. Muehlberger, I. Bergmair, M. Boehm, R. Schoeftner

Author Affiliations +

Proceedings Volume 7970, Alternative Lithographic Technologies III; 79701M (2011) https://doi.org/10.1117/12.870524
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Nanoimprint technology already demonstrated high resolution capability using hard master stamps in the mid 90's. Considering this as a well known technology, there are still restrictions making nanoimprint lithography (NIL) a competitive "next generation lithography" technique. This paper will address limitations in regard to large area master stamp manufacturing, resolution and lifetime using soft UV-NIL imprint lithography on stamps fabricated by massively parallel ion beam lithography provided by the CHARPAN tool. It provides detailed information of sub- 15 nm (dots, grids and lines) replication processes at master fabrication, working stamp replication and imprinting.

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G. Kreindl, M. Kast, D. Treiblmayr, T. Glinsner, E. Platzgummer, H. Loeschner, P. Joechl, S. Eder-Kapl, T. Nartz, M. Muehlberger, I. Bergmair, M. Boehm, and R. Schoeftner "Soft UV-NIL at the 12.5 nm scale", Proc. SPIE 7970, Alternative Lithographic Technologies III, 79701M (4 April 2011); https://doi.org/10.1117/12.870524

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