Hierarchical kernel generation for SMO application

Jason Hsih-Chie Chang; Charlie Chung-Ping Chen; Lawrence S. Melvin III

doi:10.1117/12.882808

22 March 2011 Hierarchical kernel generation for SMO application

Jason Hsih-Chie Chang, Charlie Chung-Ping Chen, Lawrence S. Melvin III

Proceedings Volume 7973, Optical Microlithography XXIV; 797323 (2011) https://doi.org/10.1117/12.882808
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Resolution enhancement technologies (RETs) are so far widely proposed in improving the quality of micro-lithography process. Latest method such as source mask optimization (SMO) is gaining popularity recently. Therefore, high speed simulator is in strong demand for growing computational complexity of RETs. In this work, we demonstrate that our Abbe-PCA method is highly efficient for source configuring and mask tuning using hierarchical pixel-based OPC.

Citation Download Citation

Jason Hsih-Chie Chang, Charlie Chung-Ping Chen, and Lawrence S. Melvin III "Hierarchical kernel generation for SMO application", Proc. SPIE 7973, Optical Microlithography XXIV, 797323 (22 March 2011); https://doi.org/10.1117/12.882808

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available