Paper
3 May 2011 Fabrication of low loss coplanar waveguides on gold-doped Czochralski-silicon
A. Abuelgasim, Kanad Mallik, P. Ashburn, C. H. De Groot
Author Affiliations +
Abstract
Coplanar waveguides fabricated on gold-doped Czochralski-silicon show reduced losses. Gold atoms implanted into silicon substrates compensate for background free carriers introduced by impurities in the material. This leads to an increased silicon resistivity which exhibits lower microwave absorption. High frequency measurements in 1-40 GHz range of coplanar waveguides fabricated on gold-doped silicon show attenuation reductions up to 70%, highlighting the benefits of deep level compensation of shallow level impurities in silicon using gold.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Abuelgasim, Kanad Mallik, P. Ashburn, and C. H. De Groot "Fabrication of low loss coplanar waveguides on gold-doped Czochralski-silicon", Proc. SPIE 8068, Bioelectronics, Biomedical, and Bioinspired Systems V; and Nanotechnology V, 806811 (3 May 2011); https://doi.org/10.1117/12.886552
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KEYWORDS
Silicon

Semiconducting wafers

Gold

Signal attenuation

Waveguides

Doping

Chemical species

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