Thermal stability on Mo/B[sub]4[/sub]C multilayers

Miriam Barthelmess; Saša Bajt

doi:10.1117/12.886751

18 May 2011 Thermal stability on Mo/B₄C multilayers

Miriam Barthelmess, Saša Bajt

Proceedings Volume 8077, Damage to VUV, EUV, and X-ray Optics III; 807710 (2011) https://doi.org/10.1117/12.886751
Event: SPIE Optics + Optoelectronics, 2011, Prague, Czech Republic

Abstract

Temperature stability of Mo/B4C multilayers with normal incidence peak reflectivity at 7 nm was investigated in a temperature range between 100°C and 900°C. With this multilayer pair we achieved up to 24% reflectivity in the asdeposited state at 6.7 nm. We investigated the effect of post-deposition annealing temperature and time on intrinsic stress, period and normal incidence reflectivity. We observed that stress alters almost linearly with temperature up to 600°C. In this temperature range the multilayer period expands by <1%. The major change in stress and period occurs in the first minutes of heat treatment. The stress relaxation is accompanied with volume and packing density increase (period expansion). This process, which happens within minutes, is followed by a diffusion controlled process.

Citation Download Citation

Miriam Barthelmess and Saša Bajt "Thermal stability on Mo/B₄C multilayers", Proc. SPIE 8077, Damage to VUV, EUV, and X-ray Optics III, 807710 (18 May 2011); https://doi.org/10.1117/12.886751

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