Large MEMS-based programmable reflective slit mask for multi-object spectroscopy fabricated using multiple wafer-level bonding

Michael Canonica; Frederic Zamkotsian; Patrick Lanzoni; Wilfried Noell; Nico de Rooij

doi:10.1117/12.910094

15 February 2012 Large MEMS-based programmable reflective slit mask for multi-object spectroscopy fabricated using multiple wafer-level bonding

Michael Canonica, Frederic Zamkotsian, Patrick Lanzoni, Wilfried Noell, Nico de Rooij

Author Affiliations +

Proceedings Volume 8252, MOEMS and Miniaturized Systems XI; 82520B (2012) https://doi.org/10.1117/12.910094
Event: SPIE MOEMS-MEMS, 2012, San Francisco, California, United States

Abstract

Multi-object spectroscopy (MOS) allows measuring infrared spectra of faint astronomical objects that provides information on the evolution of the Universe. MOS requires a slit mask for object selection at the focal plane of the telescope. We are developing MEMS-based programmable reflective slit masks composed of 2048 individually addressable micromirrors. Each micromirror measures 100 × 200 μm² and is electrostatically tilted by a precise angle of at least 20°. The main requirements for these arrays are precise and uniform tilt angle over the whole device, uniformity of the mirror electromechanical behavior, a flat mirror deformation and individual addressing capability of each mirror. This capability of our array is achieved using a line-column algorithm based on an optimized tilt angle/voltage hysteresis of the electrostatic actuator. Micromirror arrays composed of 2048 micromirrors (32 × 64) and modeled for individual addressing were fabricated using fusion and eutectic wafer-level bonding. These micromirrors without coating demonstrated a peak-to-valley deformation less than 8 nm and a tilt angle of 24° for an actuation voltage of 130 V. A first experiment of the linecolumn algorithm was demonstrated by actuating individually 2 × 2 micromirrors. In order, to avoid spoiling of the optical source by the thermal emission of the instrument, the micromirror array has to work in a cryogenic environment. Therefore, these devices were characterized in a cryogenic environment at -111°C and several lines of micromirrors were tilted successfully under these conditions.

Citation Download Citation

Michael Canonica, Frederic Zamkotsian, Patrick Lanzoni, Wilfried Noell, and Nico de Rooij "Large MEMS-based programmable reflective slit mask for multi-object spectroscopy fabricated using multiple wafer-level bonding", Proc. SPIE 8252, MOEMS and Miniaturized Systems XI, 82520B (15 February 2012); https://doi.org/10.1117/12.910094

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