Positive-tone chemically amplified fullerene resist

J. Manyam; A. Frommhold; D. X. Yang; A. McClelland; M. Manickam; J. A. Preece; R. E. Palmer; A. P. G. Robinson

doi:10.1117/12.916472

19 March 2012 Positive-tone chemically amplified fullerene resist

J. Manyam, A. Frommhold, D. X. Yang, A. McClelland, M. Manickam, J. A. Preece, R. E. Palmer, A. P. G. Robinson

Proceedings Volume 8325, Advances in Resist Materials and Processing Technology XXIX; 83251U (2012) https://doi.org/10.1117/12.916472
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

With continuing efforts to achieve higher lithographic resolution there has been on-going interest in the development of low molecular weight resists, such as molecular glasses. Here we present the initial results of a study into the development of a positive tone two component chemically amplified resist based on methanofullerene derivatives (MF) with acid labile groups (tert-butyl acetate (tBAC); tert-butoxycarbonyl (tBOC)). Mono, di, tris and hexa adducts of MFtBAC together with mono and di adducts of MF-tBOC have been evaluated with several photoacid generators. Sensitivities as high as 11 μC/cm² have been achieved in some cases and sub-100 nm features have been patterned.

Citation Download Citation

J. Manyam, A. Frommhold, D. X. Yang, A. McClelland, M. Manickam, J. A. Preece, R. E. Palmer, and A. P. G. Robinson "Positive-tone chemically amplified fullerene resist", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251U (19 March 2012); https://doi.org/10.1117/12.916472

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