Free form source and mask optimization for negative tone resist development for 22nm node contact holes

Tamer H. Coskun; Huixiong Dai; Vishnu Kamat; Ching-Mei Hsu; Gaetano Santoro; Chris Ngai; Mario Reybrouck; Grozdan Grozev; Hsu-Ting Huang

doi:10.1117/12.918459

13 March 2012 Free form source and mask optimization for negative tone resist development for 22nm node contact holes

Tamer H. Coskun, Huixiong Dai, Vishnu Kamat, Ching-Mei Hsu, Gaetano Santoro, Chris Ngai, Mario Reybrouck, Grozdan Grozev, Hsu-Ting Huang

Author Affiliations +

Proceedings Volume 8326, Optical Microlithography XXV; 83260V (2012) https://doi.org/10.1117/12.918459
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

In this paper we demonstrate the feasibility of Negative Tone Development (NTD) process to pattern 22nm node contact holes leveraging freeform source and model based assist features. We demonstrate this combined technology with detailed simulation and wafer results. Analysis also includes further improvement achievable using a freeform source compared to a conventional standard source while keeping the mask optimization approaches the same. Similar studies are performed using the Positive Tone Development (PTD) process to demonstrate the benefits of the NTD process.

Citation Download Citation

Tamer H. Coskun, Huixiong Dai, Vishnu Kamat, Ching-Mei Hsu, Gaetano Santoro, Chris Ngai, Mario Reybrouck, Grozdan Grozev, and Hsu-Ting Huang "Free form source and mask optimization for negative tone resist development for 22nm node contact holes", Proc. SPIE 8326, Optical Microlithography XXV, 83260V (13 March 2012); https://doi.org/10.1117/12.918459

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