Mask readiness for EUVL pilot line

Naoya Hayashi; Tsukasa Abe; Tadahiko Takikawa

doi:10.1117/12.923125

16 April 2012 Mask readiness for EUVL pilot line

Naoya Hayashi, Tsukasa Abe, Tadahiko Takikawa

Proceedings Volume 8352, 28th European Mask and Lithography Conference; 835204 (2012) https://doi.org/10.1117/12.923125
Event: 28th European Mask and Lithography Conference (EMLC 2012), 2012, Dresden, Germany

Abstract

EUVL pilot line will be launched in 2012 with several pre-production tools installed in world wide. Since there will be still the productivity issue on the exposure tool, certain demand of EUV masks may be required in 2012. In this presentation, the status of EUV mask readiness, such as pattern quality, related infrastructures, and mask handling flow etc., will be discussed.

Citation Download Citation

Naoya Hayashi, Tsukasa Abe, and Tadahiko Takikawa "Mask readiness for EUVL pilot line", Proc. SPIE 8352, 28th European Mask and Lithography Conference, 835204 (16 April 2012); https://doi.org/10.1117/12.923125

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