Master mold and working replica fabrication for nano-imprinting lithography for 1Tbit/inch2 and 25nm pitch bit patterned media

Hideo Kobayashi; Shuji Kishimoto; Kouta Suzuki; Hiromasa Iyama; Sakae Nakatsuka; Kazutake Taniguchi; Takaeshi Kagatsume; Takashi Sato; Tsuyoshi Watanabe

doi:10.1117/12.978286

29 June 2012 Master mold and working replica fabrication for nano-imprinting lithography for 1Tbit/inch² and 25nm pitch bit patterned media

Hideo Kobayashi, Shuji Kishimoto, Kouta Suzuki, Hiromasa Iyama, Sakae Nakatsuka, Kazutake Taniguchi, Takaeshi Kagatsume, Takashi Sato, Tsuyoshi Watanabe

Author Affiliations +

Proceedings Volume 8441, Photomask and Next-Generation Lithography Mask Technology XIX; 84411N (2012) https://doi.org/10.1117/12.978286
Event: Photomask and NGL Mask Technology XIX, 2012, Yokohama, Japan

Abstract

Bit Patterned Media (BPM) is essential of HDD media areal density increase, which will be combined with heatassisted magnetic recording (HAMR) eventually for thermal diffusion prevention. 1Tbit/inch² areal density is the first demonstration target, which is 25nm pitch hole array, for the BPM development. Nano-Imprinting Lithography (NIL) is indispensable too, so molds as well, for the BPM large-scale production for throughput. At the beginning, 52nm pitch and below was successfully made on quartz master-mold. However, by our comprehensive development and improvement in material and process, we successfully fabricate 25nm pitch master-mold by EB Lithography, 25nm pitch working-replica by Nano-Imprinting Lithography as well.

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Hideo Kobayashi, Shuji Kishimoto, Kouta Suzuki, Hiromasa Iyama, Sakae Nakatsuka, Kazutake Taniguchi, Takaeshi Kagatsume, Takashi Sato, and Tsuyoshi Watanabe "Master mold and working replica fabrication for nano-imprinting lithography for 1Tbit/inch² and 25nm pitch bit patterned media", Proc. SPIE 8441, Photomask and Next-Generation Lithography Mask Technology XIX, 84411N (29 June 2012); https://doi.org/10.1117/12.978286

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