Open Access Paper
10 October 2012 Advances in DNA photonics
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Abstract
In this paper we present our current research in exploring a DNA biopolymer for photonics applications. A new processing technique has been adopted that employs a modified soxhlet-dialysis (SD) rinsing technique to completely remove excess ionic contaminants from the DNA biopolymer, resulting in a material with greater mechanical stability and enhanced performance reproducibility. This newly processed material has been shown to be an excellent material for cladding layers in poled polymer electro-optic (EO) waveguide modulator applications. Thin film poling results are reported for materials using the DNA biopolymer as a cladding layer, as are results for beam steering devices also using the DNA biopolymer. Finally, progress on fabrication of a Mach Zehnder EO modulator with DNA biopolymer claddings using nanoimprint lithography techniques is reported.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Emily M. Heckman, Roberto S. Aga, Emily M. Fehrman Cory, Fahima Ouchen, Alyssa Lesko, Brian Telek, Jack Lombardi, Carrie M. Bartsch, and James G. Grote "Advances in DNA photonics", Proc. SPIE 8464, Nanobiosystems: Processing, Characterization, and Applications V, 84640P (10 October 2012); https://doi.org/10.1117/12.930873
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Biopolymers

Cladding

Waveguides

Polymers

Modulators

Beam steering

Thin films

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