Comparison of critical dimension measurements
of a mask inspection system with a CD-SEM

Jan P. Heumann; Albrecht Ullrich; Clemens S. Utzny; Stefan Meusemann; Frank Kromer; John M. Whittey; Edgardo Garcia; Mark Wagner; Norbert J. Schmidt

doi:10.1117/12.977248

8 November 2012 Comparison of critical dimension measurements of a mask inspection system with a CD-SEM

Jan P. Heumann, Albrecht Ullrich, Clemens S. Utzny, Stefan Meusemann, Frank Kromer, John M. Whittey, Edgardo Garcia, Mark Wagner, Norbert J. Schmidt

Author Affiliations +

Proceedings Volume 8522, Photomask Technology 2012; 85220G (2012) https://doi.org/10.1117/12.977248
Event: SPIE Photomask Technology, 2012, Monterey, California, United States

Abstract

Critical dimension uniformity (CDU) is an important parameter for photomask and wafer manufacturing. In order to reduce long-range CD variation, compensation techniques for mask writers and scanners have been developed. Both techniques require mask CD measurements with high spatial sampling. Scanning electron microscopes (SEMs), which provide CD measurements at very high precision, cannot in practice provide the required spatial sampling due to their low speed. In contrast mask inspection systems, some of which have the ability to perform optical CD measurements with very high sampling frequencies, are an interesting alternative. In this paper we evaluate the CDU measurement results with those of a CD-SEM.

Citation Download Citation

Jan P. Heumann, Albrecht Ullrich, Clemens S. Utzny, Stefan Meusemann, Frank Kromer, John M. Whittey, Edgardo Garcia, Mark Wagner, and Norbert J. Schmidt "Comparison of critical dimension measurements of a mask inspection system with a CD-SEM", Proc. SPIE 8522, Photomask Technology 2012, 85220G (8 November 2012); https://doi.org/10.1117/12.977248

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