Photomask etch: addressing the resist challenges for advanced phase-shift and binary photomasks

Michael Grimbergen; Madhavi Chandrachood; Keven Yu; Toi Yue Becky Leung; Amitabh Sabharwal; Ajay Kumar

doi:10.1117/12.981215

8 November 2012 Photomask etch: addressing the resist challenges for advanced phase-shift and binary photomasks

Michael Grimbergen, Madhavi Chandrachood, Keven Yu, Toi Yue Becky Leung, Amitabh Sabharwal, Ajay Kumar

Proceedings Volume 8522, Photomask Technology 2012; 85222M (2012) https://doi.org/10.1117/12.981215
Event: SPIE Photomask Technology, 2012, Monterey, California, United States

Abstract

As lithography requirements mandate ever-thinner resist thickness, the need for in-situ monitoring has become more urgent. In this paper we present an in-situ optical methodology-based system to determine residual photoresist thickness during advanced photomask etch with < 1000 Å photoresist. Several types of phase-shift masks and photoresists were examined. A series of masks were etched to demonstrate the performance of the system. Results show an average accuracy of better than 2%, with a maximum absolute range of all tests within 8%.

Citation Download Citation

Michael Grimbergen, Madhavi Chandrachood, Keven Yu, Toi Yue Becky Leung, Amitabh Sabharwal, and Ajay Kumar "Photomask etch: addressing the resist challenges for advanced phase-shift and binary photomasks", Proc. SPIE 8522, Photomask Technology 2012, 85222M (8 November 2012); https://doi.org/10.1117/12.981215

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available