Paper
26 March 2013 Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method
Author Affiliations +
Abstract
Directed self-assembly lithography (DSAL), which combines self-assembling materials and a lithographically defined prepattern, is a potential candidate to extend optical lithography beyond 22 nm. To take full advantage of DSAL requires diminishing not only systematic error modes but also random error modes by carefully designing a lithographically defined prepattern and precisely adjusting process conditions. To accomplish this with satisfactory accuracy, we have proposed a novel method to evaluate DSAL error modes based on simulations using dissipative particle dynamics (DPD). We have found that we can estimate not only systematic errors but also random errors qualitatively by simulations.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Katsuyoshi Kodera, Shimon Maeda, Satoshi Tanaka, Shoji Mimotogi, Yuriko Seino, Hiroki Yonemitsu, Hironobu Sato, and Tsukasa Azuma "Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method", Proc. SPIE 8680, Alternative Lithographic Technologies V, 868015 (26 March 2013); https://doi.org/10.1117/12.2011439
Lens.org Logo
CITATIONS
Cited by 20 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Particles

Critical dimension metrology

Lithography

Error analysis

Neodymium

Directed self assembly

Polymethylmethacrylate

Back to Top