PS-b-PHEMA: synthesis, characterization, and processing of a high X polymer for directed self-assembly lithography

Jing Cheng; Richard A. Lawson; Wei-Ming Yeh; Nathan D. Jarnagin; Laren M. Tolbert; Clifford L. Henderson

doi:10.1117/12.2021417

5 April 2013 PS-b-PHEMA: synthesis, characterization, and processing of a high χ polymer for directed self-assembly lithography

Jing Cheng, Richard A. Lawson, Wei-Ming Yeh, Nathan D. Jarnagin, Laren M. Tolbert, Clifford L. Henderson

Author Affiliations +

Proceedings Volume 8680, Alternative Lithographic Technologies V; 86801W (2013) https://doi.org/10.1117/12.2021417
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

As an alternative lithography technique, directed self-assembly (DSA) of block copolymers has shown to be promising for next generation high resolution patterning. PS-b-PMMA has been widely studied for its use as a block copolymer in directed self-assembly and has demonstrated patterned features down to size scales on the order of 20 nm pitch. However, due to the modest χ value for PS-b-PMMA (χ=0.038), this 20 nm feature pitch representes roughly the limiting capability of PS-b-PMMA. To achieve smaller pitch features, new block copolymers with higher χ values must be developed for use in DSA lithography. Here, poly(styrene)-b-poly(hydroxyehtylmethacrylate) or PS-b-PHEMS is introduced as one possible such high χ polymer. PS-b-PHEMA with controlled Mw and PDI was successfully synthesized via ATRP and fully characterized by NMR, GPC and FTIR. As a first demonstration of sub-20 nm pitch capability in PS-b-PHEMA, a 15 nm pitch size lamella structure in PS-b-PHEMA is shown. PS-b-PHEMA has good thermal stability, allowing it to be rapidly annealed thermally. PS-b-PHEMA also is shown to have improved etch contrast between the two blocks as compared to PS-b-PMMA. The χ value for PS-b-PHEMA is estimated to be 0.37 based on experimental pitch scaling studies, which is almost 10 times of the χ value for PS-b-PMMA.

Citation Download Citation

Jing Cheng, Richard A. Lawson, Wei-Ming Yeh, Nathan D. Jarnagin, Laren M. Tolbert, and Clifford L. Henderson "PS-b-PHEMA: synthesis, characterization, and processing of a high χ polymer for directed self-assembly lithography", Proc. SPIE 8680, Alternative Lithographic Technologies V, 86801W (5 April 2013); https://doi.org/10.1117/12.2021417

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