Paper
27 September 2013 Optimization of LaN/B multilayer mirrors for 6.x nm wavelength
I. A. Makhotkin, R. W. E. van de Kruijs, E. Zoethout, E. Louis, F. Bijkerk
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Abstract
In this article we present an overview of the optimization of LaN/B multilayers that enabled the deposition of a multilayer with a normal incidence reflectance of 57.3 % at 6.6 nm wavelength, the highest value reported to date. Two different ways of nitridation of the La layers were investigated: firstly N-ion post treatment of the La layer and secondly reactive magnetron sputtering of La in N2 atmosphere. Initially the optimization of the multilayers was performed for 50 period test multilayers, followed by the selection of the best process to study the stability of the full stack deposition and the optical performance of the mirrors. The scaling of reflectivity with increasing number of periods for LaN/B multilayer mirrors will also be discussed.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
I. A. Makhotkin, R. W. E. van de Kruijs, E. Zoethout, E. Louis, and F. Bijkerk "Optimization of LaN/B multilayer mirrors for 6.x nm wavelength", Proc. SPIE 8848, Advances in X-Ray/EUV Optics and Components VIII, 88480O (27 September 2013); https://doi.org/10.1117/12.2024199
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Cited by 2 scholarly publications.
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KEYWORDS
Reflectivity

Multilayers

Mirrors

Lanthanum

Sputter deposition

Lithography

Extreme ultraviolet

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