Control of PS-b-PMMA directed self-assembly registration by laser induced millisecond thermal annealing

Alan G. Jacobs; Byungki Jung; Christopher K. Ober; Michael O. Thompson

doi:10.1117/12.2046513

28 March 2014 Control of PS-b-PMMA directed self-assembly registration by laser induced millisecond thermal annealing

Alan G. Jacobs, Byungki Jung, Christopher K. Ober, Michael O. Thompson

Proceedings Volume 9049, Alternative Lithographic Technologies VI; 90492B (2014) https://doi.org/10.1117/12.2046513
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Directed self-assembly of PS-b-PMMA during laser spike annealing at peak temperatures of 300-800°C for dwells of 1- 10 ms has been explored. The enhanced mobility of polymer chains at these temperatures improves registration compared to conventional thermal anneals. PS-b-PMMA films (forming 15 nm line/space standing lamellae) were cast on chemically patterned substrates with a copolymer neutral layer and annealed by laser and hot-plate (2 minutes 250°C). Annealing by hot plate or multiple laser scans resulted in well-aligned features over micron length scales. By laser annealing multiple times, defectivity can be reduced by ~60%. However, laser annealing for only 10 ms before performing a hot plate anneal reduced defectivity by ~80%. Additionally, defects are more often localized as dislocation pairs rather than regions perpendicular to the underlying directing pattern resulting in far greater total alignment.

Citation Download Citation

Alan G. Jacobs, Byungki Jung, Christopher K. Ober, and Michael O. Thompson "Control of PS-b-PMMA directed self-assembly registration by laser induced millisecond thermal annealing", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90492B (28 March 2014); https://doi.org/10.1117/12.2046513

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