Development of fast DSA simulation method using OCTA system

Hiroshi Morita

doi:10.1117/12.2046090

28 March 2014 Development of fast DSA simulation method using OCTA system

Hiroshi Morita

Proceedings Volume 9049, Alternative Lithographic Technologies VI; 90492O (2014) https://doi.org/10.1117/12.2046090
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

We proposed the DSA simulation technique which is the combined method of two dimensional (2D) SCF and three dimensional (3D) dissipative particle dynamics (DPD) methods by using the density biased Monte Carlo method. This combined method has advantages of both an accuracy of SCF and fast and stably-working simulation of 3D DPD methods regardless of the strong segregation regime. Using our techniques, several results, such as DSA film structure on the chemical guide, are obtained. We also discuss the availability of our simulation technique using our free software, OCTA (in detail, see http://octa.jp) system.

Citation Download Citation

Hiroshi Morita "Development of fast DSA simulation method using OCTA system", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90492O (28 March 2014); https://doi.org/10.1117/12.2046090

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