Paper
28 March 2014 Self-aligned quadruple patterning-aware routing
Author Affiliations +
Abstract
Self-Aligned Quadruple Patterning (SAQP) is one of the most leading techniques in 14 nm node and beyond. However, the construction of feasible layout configurations must follow stricter constraints than in LELELE triple patterning process. Some SAQP layout decomposition methods were recently proposed. However, due to strict constraints required for feasible SAQP layout, the decomposition strategy considering an arbitrary layout does not seem realistic. In this paper, we propose a new routing method for feasible SAQP layout requiring no decomposition. Our method performs detailed routing by correct-by-construction approach and offers compliant layout configuration without any pitch conflict.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fumiharu Nakajima, Chikaaki Kodama, Hirotaka Ichikawa, Koichi Nakayama, Shigeki Nojima, and Toshiya Kotani "Self-aligned quadruple patterning-aware routing", Proc. SPIE 9053, Design-Process-Technology Co-optimization for Manufacturability VIII, 90530C (28 March 2014); https://doi.org/10.1117/12.2046241
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CITATIONS
Cited by 8 scholarly publications.
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KEYWORDS
Photomasks

Double patterning technology

Optical lithography

Lithography

Metals

Semiconducting wafers

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