Pattern-based pre-OPC operation to improve model-based OPC runtime

Piyush Verma; Fadi Batarseh; Shikha Somani; Jingyu Wang; Sarah McGowan; Sriram Madhavan

doi:10.1117/12.2068998

8 October 2014 Pattern-based pre-OPC operation to improve model-based OPC runtime

Piyush Verma, Fadi Batarseh, Shikha Somani, Jingyu Wang, Sarah McGowan, Sriram Madhavan

Proceedings Volume 9235, Photomask Technology 2014; 923506 (2014) https://doi.org/10.1117/12.2068998
Event: SPIE Photomask Technology, 2014, Monterey, California, United States

Abstract

Full chip model based Optical Proximity Correction (OPC) at advanced nodes involves iteratively modifying the drawn polygon shapes while simulating them through complex optical and resist models. Due to the computational complexity of the models and the large size of VLSI designs, these mask simulations run for very long times. In this study we propose a pattern replacement step to generate a partial mask solution before applying model based OPC correction. Since the pattern replacement step is very fast and model based OPC has to be applied only to a portion of the design, total mask generation runtime is significantly reduced.

Citation Download Citation

Piyush Verma, Fadi Batarseh, Shikha Somani, Jingyu Wang, Sarah McGowan, and Sriram Madhavan "Pattern-based pre-OPC operation to improve model-based OPC runtime", Proc. SPIE 9235, Photomask Technology 2014, 923506 (8 October 2014); https://doi.org/10.1117/12.2068998

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