Paper
19 March 2015 Experimental study of sub-DSA resolution assist features (SDRAF)
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Abstract
Cylindrical directed self-assembly (DSA) nanostructures is a promising candidate for patterning the contacts and vias in integrated circuits. To match the contact patterns in an IC layout, physical guiding templates have been adopted to generate aperiodic DSA patterns, and templates of different sizes could lead to various DSA patterns. It is found in the experiment that the density of guiding templates has a strong influence on the DSA patterns. At a low template density, templates tend to become overfilled and result in DSA defects. In this paper, we experimentally demonstrate an effective solution to counteract the influence of template pattern density on the quality of DSA using sub-DSA-resolution Assist Features (SDRAFs). We show that SDRAFs can reduce the DSA defects significantly.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
He Yi, Joost Bekaert, Roel Gronheid, Geert Vandenberghe, Kathleen Nafus, and H.-S. Philip Wong "Experimental study of sub-DSA resolution assist features (SDRAF)", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94231F (19 March 2015); https://doi.org/10.1117/12.2085866
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CITATIONS
Cited by 6 scholarly publications and 1 patent.
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KEYWORDS
Directed self assembly

Scanning electron microscopy

Optical lithography

Lithography

Polymers

Semiconducting wafers

SRAF

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