Optimum ArFi laser bandwidth for 10nm node logic imaging performance

Paolo Alagna; Omar Zurita; Vadim Timoshkov; Patrick Wong; Gregory Rechtsteiner; Jan Baselmans; Julien Mailfert

doi:10.1117/12.2085823

18 March 2015 Optimum ArFi laser bandwidth for 10nm node logic imaging performance

Paolo Alagna, Omar Zurita, Vadim Timoshkov, Patrick Wong, Gregory Rechtsteiner, Jan Baselmans, Julien Mailfert

Proceedings Volume 9426, Optical Microlithography XXVIII; 942609 (2015) https://doi.org/10.1117/12.2085823
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Lithography process window (PW) and CD uniformity (CDU) requirements are being challenged with scaling across all device types. Aggressive PW and yield specifications put tight requirements on scanner performance, especially on focus budgets resulting in complicated systems for focus control. In this study, an imec N10 Logic-type test vehicle was used to investigate the E95 bandwidth impact on six different Metal 1 Logic features. The imaging metrics that track the impact of light source E95 bandwidth on performance of hot spots are: process window (PW), line width roughness (LWR), and local critical dimension uniformity (LCDU).

In the first section of this study, the impact of increasing E95 bandwidth was investigated to observe the lithographic process control response of the specified logic features. In the second section, a preliminary assessment of the impact of lower E95 bandwidth was performed. The impact of lower E95 bandwidth on local intensity variability was monitored through the CDU of line end features and the LWR power spectral density (PSD) of line/space patterns. The investigation found that the imec N10 test vehicle (with OPC optimized for standard E95 bandwidth of300fm) features exposed at 200fm showed pattern specific responses, suggesting areas of potential interest for further investigation.

Citation Download Citation

Paolo Alagna, Omar Zurita, Vadim Timoshkov, Patrick Wong, Gregory Rechtsteiner, Jan Baselmans, and Julien Mailfert "Optimum ArFi laser bandwidth for 10nm node logic imaging performance", Proc. SPIE 9426, Optical Microlithography XXVIII, 942609 (18 March 2015); https://doi.org/10.1117/12.2085823

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