Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality

Lina Shen; Sikun Li; Xiangzhao Wang; Guanyong Yan

doi:10.1117/12.2181336

18 March 2015 Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality

Lina Shen, Sikun Li, Xiangzhao Wang, Guanyong Yan

Author Affiliations +

Proceedings Volume 9426, Optical Microlithography XXVIII; 94261E (2015) https://doi.org/10.1117/12.2181336
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

In high-NA and hyper-NA lithography systems, the polarization aberration of projection lens leads to imaging degradations. Typically, numerical simulations are used to explore the relationship. In this paper, analytical analysis for the impact of polarization aberration of projection lens on the aerial image of alternating phase-shift mask (Alt-PSM) is realized. The analytical expressions of image placement error (IPE) and best focus shift (BFS) caused by polarization aberration are derived from the intensity of aerial image. The derived expressions match simulation results extremely well, and can be used to understand more fully the detrimental impact of polarization aberration on lithographic imaging quality. The linear relationships between IPE and odd items of Pauli-Zernike polarization aberrations, as well as that between BFS and even items of Pauli-Zernike polarization aberrations are established, using linear polarization illumination. The accuracy of the linear relationships is assessed by the least square method.

Citation Download Citation

Lina Shen, Sikun Li, Xiangzhao Wang, and Guanyong Yan "Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality", Proc. SPIE 9426, Optical Microlithography XXVIII, 94261E (18 March 2015); https://doi.org/10.1117/12.2181336

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