Non-CAR resists and advanced materials for Massively Parallel E-Beam Direct Write process integration

Marie-Line Pourteau; Isabelle Servin; Kévin Lepinay; Cyrille Essomba; Bernard Dal'Zotto; Jonathan Pradelles; Ludovic Lattard; Pieter Brandt; Marco Wieland

doi:10.1117/12.2218884

22 March 2016 Non-CAR resists and advanced materials for Massively Parallel E-Beam Direct Write process integration

Marie-Line Pourteau, Isabelle Servin, Kévin Lepinay, Cyrille Essomba, Bernard Dal'Zotto, Jonathan Pradelles, Ludovic Lattard, Pieter Brandt, Marco Wieland

Author Affiliations +

Proceedings Volume 9777, Alternative Lithographic Technologies VIII; 977713 (2016) https://doi.org/10.1117/12.2218884
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

The emerging Massively Parallel-Electron Beam Direct Write (MP-EBDW) is an attractive high resolution high throughput lithography technology. As previously shown, Chemically Amplified Resists (CARs) meet process/integration specifications in terms of dose-to-size, resolution, contrast, and energy latitude. However, they are still limited by their line width roughness. To overcome this issue, we tested an alternative advanced non-CAR and showed it brings a substantial gain in sensitivity compared to CAR. We also implemented and assessed in-line post-lithographic treatments for roughness mitigation. For outgassing-reduction purpose, a top-coat layer is added to the total process stack. A new generation top-coat was tested and showed improved printing performances compared to the previous product, especially avoiding dark erosion: SEM cross-section showed a straight pattern profile. A spin-coatable charge dissipation layer based on conductive polyaniline has also been tested for conductivity and lithographic performances, and compatibility experiments revealed that the underlying resist type has to be carefully chosen when using this product. Finally, the Process Of Reference (POR) trilayer stack defined for 5 kV multi-e-beam lithography was successfully etched with well opened and straight patterns, and no lithography-etch bias.

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Marie-Line Pourteau, Isabelle Servin, Kévin Lepinay, Cyrille Essomba, Bernard Dal'Zotto, Jonathan Pradelles, Ludovic Lattard, Pieter Brandt, and Marco Wieland "Non-CAR resists and advanced materials for Massively Parallel E-Beam Direct Write process integration", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 977713 (22 March 2016); https://doi.org/10.1117/12.2218884

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