Layer aware source mask target optimization

Ao Chen; Yee Mei Foong; Jessy Schramm; Liang Ji; Stephen Hsu; James Guerrero; Xiaoyang Li; Joe Shaw; Joe Wang

doi:10.1117/12.2219864

15 March 2016 Layer aware source mask target optimization

Ao Chen, Yee Mei Foong, Jessy Schramm, Liang Ji, Stephen Hsu, James Guerrero, Xiaoyang Li, Joe Shaw, Joe Wang

Proceedings Volume 9780, Optical Microlithography XXIX; 97801A (2016) https://doi.org/10.1117/12.2219864
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

In this paper, we present the approach and results of layer-aware source mask target optimization. In this approach, the design target is co-optimized during source mask optimization (SMO) by considering inter-layer constraints. We tested the method on a 2x nm node metal layer by using both standard and customized cost functions for source optimization. Variable targets were defined for two process window limiting critical pattern cells, with contact-to-metal and metal-tovia coverage rules taken into consideration. The results indicate that layer-aware source mask target optimization gives consistent process window improvement over conventional SMO. The optimized targets prove to be a good balance between lithography process window and post-etch inter-layer coverage margin.

Citation Download Citation

Ao Chen, Yee Mei Foong, Jessy Schramm, Liang Ji, Stephen Hsu, James Guerrero, Xiaoyang Li, Joe Shaw, and Joe Wang "Layer aware source mask target optimization", Proc. SPIE 9780, Optical Microlithography XXIX, 97801A (15 March 2016); https://doi.org/10.1117/12.2219864

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