Paper
16 December 1988 Measurements Of X-Ray Surface Scattering And Diffraction Properties Of Selected Multilayers
A. Hornstrup, F. E. Christensen, J L. Wood, M. Bending, H W. Schnopper
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Abstract
We present measurements of X-ray scattering from various substrates, from W/Si and W/C multilayers deposited on ordinary and superpolished substrates and diffraction measurements from these multilayers. We find no significant change in scatter after deposition of the multilayer in the cases with ordinary substrates, but there is some evidence of surface smoothing in one case with superpolished fused quartz as substrate. The measurements show that multilayers deposited on conventional Si-substrates have a mosaicity which is correlated with the scattering measurements. This correlation, however, is not found for multilayers on supersmooth substrates. Reflectivity-and Darwin curve measurements show that a well defined d-spacing is obtained in all cases. There is, however, an interesting difference between multilayers on supersmooth substrates and on ordinary substrates which cannot be explained by conven-tional imperfections.
© (1988) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Hornstrup, F. E. Christensen, J L. Wood, M. Bending, and H W. Schnopper "Measurements Of X-Ray Surface Scattering And Diffraction Properties Of Selected Multilayers", Proc. SPIE 0984, X-Ray Multilayers in Diffractometers, Monochromators, and Spectrometers, (16 December 1988); https://doi.org/10.1117/12.948785
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Cited by 6 scholarly publications.
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KEYWORDS
Reflectivity

Silicon carbide

Diffraction

Scattering

Monochromators

Silicon

Scatter measurement

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