Paper
15 September 2016 Quantitative characterization of aberrations in x-ray optics
Frank Seiboth, Maik Kahnt, Maria Scholz, Martin Seyrich, Felix Wittwer, Jan Garrevoet, Gerald Falkenberg, Andreas Schropp, Christian G. Schroer
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Abstract
Due to the weak interaction of X-rays with matter and their small wavelength on the atomic scale, stringent requirements are put on X-ray optics manufacturing and metrology. As a result, these optics often suffer from aberrations. Until now, X-ray optics were mainly characterized by their focal spot size and efficiency. How- ever, both measures provide only insufficient information about optics quality. Here, we present a quantitative analysis of residual aberrations in current beryllium compound refractive lenses using ptychography followed by a determination of the wavefront error and subsequent Zernike polynomial decomposition. Known from visible light optics, we show that these measures can provide an adequate tool to determine and compare the quality of various X-ray optics.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Frank Seiboth, Maik Kahnt, Maria Scholz, Martin Seyrich, Felix Wittwer, Jan Garrevoet, Gerald Falkenberg, Andreas Schropp, and Christian G. Schroer "Quantitative characterization of aberrations in x-ray optics", Proc. SPIE 9963, Advances in X-Ray/EUV Optics and Components XI, 99630P (15 September 2016); https://doi.org/10.1117/12.2237646
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Cited by 3 scholarly publications.
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KEYWORDS
X-ray optics

Beryllium

Wavefronts

Zernike polynomials

Electroluminescent displays

X-rays

Monochromatic aberrations

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