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13 June 2022 High NA EUV enabling cost efficient scaling for N+1 technology nodes
Greet Storms, Sjoerd Lok, Rob van Ballegoij, Jan van Schoot, Rudy Peeters, Diederik de Bruin, Kars Troost, Teun van Gogh
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Proceedings Volume PC12051, Optical and EUV Nanolithography XXXV; PC1205104 (2022) https://doi.org/10.1117/12.2617240
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States
Abstract
With the introduction of High NA EUV technology the continuation of scaling semiconductor devices in a cost efficient manner will be secured for several technology nodes to come. In this paper we will discuss the benefits of High NA technology from a process complexity reduction point of view as well as the positive impact that this new lithography platform will bring to the industry in terms of cost of technology reduction.
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Greet Storms, Sjoerd Lok, Rob van Ballegoij, Jan van Schoot, Rudy Peeters, Diederik de Bruin, Kars Troost, and Teun van Gogh "High NA EUV enabling cost efficient scaling for N+1 technology nodes", Proc. SPIE PC12051, Optical and EUV Nanolithography XXXV, PC1205104 (13 June 2022); https://doi.org/10.1117/12.2617240
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KEYWORDS
Extreme ultraviolet
Lithography
Semiconductors
EUV optics
Logic
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