High-precision EUV mask process development

Shingo Yoshikawa

doi:10.1117/12.2656163

15 September 2022 High-precision EUV mask process development

Shingo Yoshikawa

Proceedings Volume PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; PC123250Q (2022) https://doi.org/10.1117/12.2656163
Event: Photomask Japan 2022, 2022, Online Only

Conference Poster

Abstract

This poster was prepared for the Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology (2022).

Citation Download Citation

Shingo Yoshikawa "High-precision EUV mask process development", Proc. SPIE PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250Q (15 September 2022); https://doi.org/10.1117/12.2656163

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