Presentation
26 September 2023 Progress report on actinic patterned mask inspection for EUVL
Safak Sayan
Author Affiliations +
Abstract
This conference presentation was prepared for Photomask Japan 2023.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Safak Sayan "Progress report on actinic patterned mask inspection for EUVL", Proc. SPIE PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1291504 (26 September 2023); https://doi.org/10.1117/12.3012431
Advertisement
Advertisement
Back to Top