Current performance of electron multi-beam mask writers and future plans toward high-NA EUV era

Jumpei Yasuda

doi:10.1117/12.3012448

26 September 2023 Current performance of electron multi-beam mask writers and future plans toward high-NA EUV era

Jumpei Yasuda

Proceedings Volume PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; PC129150J (2023) https://doi.org/10.1117/12.3012448
Event: Photomask Japan 2023, 2023, Online Only

Abstract

This conference presentation was prepared for Photomask Japan 2023.

Conference Presentation

Citation Download Citation

Jumpei Yasuda "Current performance of electron multi-beam mask writers and future plans toward high-NA EUV era", Proc. SPIE PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150J (26 September 2023); https://doi.org/10.1117/12.3012448

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