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Editorial

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Burn J. Lin
J. Micro/Nanolith. MEMS MOEMS.   doi: 10.1117/1.3098441

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Special Section on Double-Patterning Lithography

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William H. Arnold
J. Micro/Nanolith. MEMS MOEMS.   doi: 10.1117/1.3092834

Open Access Open Access

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Karsten Bubke; Robert de Kruif; Jan Hendrik Peters; Mircea Dusa; Brid Connolly
J. Micro/Nanolith. MEMS MOEMS.   doi: 10.1117/1.3023078
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Christopher P. Ausschnitt; Scott D. Halle
J. Micro/Nanolith. MEMS MOEMS.   doi: 10.1117/1.3023079
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Andrew Carlson; Tsu-Jae King Liu
J. Micro/Nanolith. MEMS MOEMS.   doi: 10.1117/1.3059550

Articles

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Gary A. Glass; Johnny F. Dias; Alexander D. Dymnikov; Louis M. Houston; Bibhudutta Rout
J. Micro/Nanolith. MEMS MOEMS.   doi: 10.1117/1.3082185
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Ming-Chuan Yang
J. Micro/Nanolith. MEMS MOEMS.   doi: 10.1117/1.3099700
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