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13 July 2023 Wen-li Wu talks about advances in x-ray-based semiconductor metrology
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Abstract

JM3 Associate Editor Qinghuang Lin interviews Wen-li Wu, retired from the National Institute of Standards and Technology. With R. Joseph Kline, Ronald L. Jones, Hae-Jeong Lee, Eric K. Lin, Daniel F. Sunday, Chengqing Wang, Tengjiao Hu, and Christopher L. Soles, Wu is the lead author of “ Review of the key milestones in the development of critical dimension small angle x-ray scattering at National Institute of Standards and Technology,” a review paper in the Special Section on 3D Metrology in the July–September 2023 issue of the Journal of Micro/Nanopatterning, Materials, and Metrology.

Lin: Wen-li Wu talks about advances in x-ray-based semiconductor metrology
CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 International License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
Qinghuang Lin "Wen-li Wu talks about advances in x-ray-based semiconductor metrology," Journal of Micro/Nanopatterning, Materials, and Metrology 22(3), 030701 (13 July 2023). https://doi.org/10.1117/1.JMM.22.3.030701
Published: 13 July 2023
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KEYWORDS
Metrology

Standards development

Semiconductors

3D metrology

Lead

Scattering

X-ray technology

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