Mr. Ahmad Ahmad Profile

Ahmad Ahmad

at Technische Univ Ilmenau

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 26 September 2019 Paper

High throughput AFM inspection system with parallel active cantilevers

M. Holz, C. Reuter, A. Reum, A. Ahmad, M. Hofmann, T. Ivanov, I. Rangelow, J. Stauffenberg, E. Manske, C. Du, X. Q. Zhou, N. Okamoto, A. N. Takashima, H. S. Lee

Proceedings Volume 11148, 111481E (2019) https://doi.org/10.1117/12.2537009

KEYWORDS: Inspection, Atomic force microscopy, Chemical mechanical planarization, Actuators, Metrology, Semiconductors, Optical inspection, Charged particle optics, Electron beams, Photomasks

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Proceedings Article | 26 September 2019 Paper

Atomic force microscope integrated into a scanning electron microscope for fabrication and metrology at the nanometer scale

Mathias Holz, Christoph Reuter, Alexander Reum, Ahmad Ahmad, Martin Hofmann, Tzvetan Ivanov, Stephan Mechold, Ivo Rangelow

Proceedings Volume 11148, 111481F (2019) https://doi.org/10.1117/12.2537018

KEYWORDS: Scanning electron microscopy, Atomic force microscope, Electron microscopes, Metrology, Electron beams, Nanofabrication, Diamond, Scanning probe lithography, Microscopy, Overlay metrology

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Proceedings Article | 26 March 2019 Paper

Parallel active cantilever AFM tool for high-throughput inspection and metrology

Mathias Holz, Christoph Reuter, Ahmad Ahmad, Alexander Reum, Tzvetan Ivanov, Elshad Guliyev, Ivo Rangelow, Ho-Se Lee

Proceedings Volume 10959, 1095929 (2019) https://doi.org/10.1117/12.2515091

KEYWORDS: Metrology, Atomic force microscopy, Inspection, Semiconducting wafers, Actuators, Photomasks, Silicon, Digital signal processing, Field programmable gate arrays, Imaging systems

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Proceedings Article | 19 March 2018 Presentation + Paper

Field-emission scanning probe lithography with self-actuating and self-sensing cantilevers for devices with single digit nanometer dimensions

Ivo Rangelow, Claudia Lenk , Martin Hofmann , Steve Lenk , Tzvetan Ivanov , Ahmad Ahmad , Marcus Kaestner, Elshad Guliyev, Christoph Reuter, Matthias Budden, Jens-Peter Zöllner, Mathias Holz , Alexander Reum, Zahid Durrani, Mervyn Jones, Cemal Aydogan, Mahmut Bicer, B. Erdem Alaca, Michael Kuehnel, Thomas Fröhlich, Roland Fuessl, E. Manske

Proceedings Volume 10584, 1058406 (2018) https://doi.org/10.1117/12.2299955

KEYWORDS: Silicon, Lithography, Etching, Scanning probe lithography, Cryogenics, Optical alignment, Nanoelectronics, Reactive ion etching, Nanolithography, Electron beam lithography

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Proceedings Article | 31 January 2018 Paper

Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices

Ivo Rangelow, Claudia Lenk , Martin Hofmann , Tzvetan Ivanov, Steve Lenk, Elshad Guliyev, Marcus Kaestner, Cemal Aydogan, Mahmut Bicer, B. Erdem Alaca, Onur Ates, Hamdi Torun, Arda Yalcinkaya, Ahmad Ahmad, Alexander Reum, Mathias Holz

Proceedings Volume 10456, 1045621 (2018) https://doi.org/10.1117/12.2282606

KEYWORDS: Lithography, Scanning probe lithography, Cryogenics, Etching, Optics manufacturing, Nanostructures, Nanolithography, Optical lithography, Split ring resonators, Image resolution

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SPIE Journal Paper | 27 July 2015

Fast atomic force microscopy with self-transduced, self-sensing cantilever

Ahmad Ahmad, Tzvetan Ivanov, Tihomir Angelov, Ivo Rangelow

JM3, Vol. 14, Issue 03, 031209, (July 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031209

KEYWORDS: Atomic force microscopy, Silicon, Lithography, Transducers, Scanners, Wheatstone bridges, Adaptive control, Semiconducting wafers, Amplifiers, Metrology

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SPIE Journal Paper | 10 June 2015

Advanced electric-field scanning probe lithography on molecular resist using active cantilever

Marcus Kaestner, Cemal Aydogan, Tzvetan Ivanov, Ahmad Ahmad, Tihomir Angelov, Alexander Reum, Valentyn Ishchuk, Yana Krivoshapkina, Manuel Hofer, Steve Lenk, Ivaylo Atanasov, Mathias Holz, Ivo Rangelow

JM3, Vol. 14, Issue 03, 031202, (June 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031202

KEYWORDS: Scanning probe lithography, Optical lithography, Lithography, Optical alignment, Semiconducting wafers, Atomic force microscopy, Electron beam lithography, Inspection, Navigation systems, Electrons

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Proceedings Article | 19 March 2015 Paper

Self-actuated, self-sensing cantilever for fast CD measurement

Ahmad Ahmad, Tzvetan Ivanov, Alexander Reum, Elshad Guliyev, Tihomir Angelov, Andreas Schuh, Marcus Kaestner, Ivaylo Atanasov, Manuel Hofer, Mathias Holz, Ivo Rangelow

Proceedings Volume 9424, 94240P (2015) https://doi.org/10.1117/12.2085760

KEYWORDS: Atomic force microscopy, Silicon, Sensors, Metrology, Lithography, Actuators, Amplifiers, 3D metrology, Semiconducting wafers, Scanners

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Proceedings Article | 17 March 2015 Paper

Advanced electric-field scanning probe lithography on molecular resist using active cantilever

Marcus Kaestner, Cemal Aydogan, Hubert-Seweryn Lipowicz, Tzvetan Ivanov, Steve Lenk, Ahmad Ahmad, Tihomir Angelov, Alexander Reum, Valentyn Ishchuk, Ivaylo Atanasov, Yana Krivoshapkina, Manuel Hofer, Mathias Holz, Ivo Rangelow

Proceedings Volume 9423, 94230E (2015) https://doi.org/10.1117/12.2085846

KEYWORDS: Scanning probe lithography, Lithography, Optical lithography, Electron beam lithography, Optical alignment, Semiconducting wafers, Atomic force microscopy, Inspection, Imaging systems, Control systems

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Proceedings Article | 28 March 2014 Paper

Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever

Marcus Kaestner, Konrad Nieradka, Tzvetan Ivanov, Steve Lenk, Yana Krivoshapkina, Ahmad Ahmad, Tihomir Angelov, Elshad Guliyev, Alexander Reum, Matthias Budden, Tomas Hrasok, Manuel Hofer, Christian Neuber, Ivo Rangelow

Proceedings Volume 9049, 90490C (2014) https://doi.org/10.1117/12.2046973

KEYWORDS: Scanning probe lithography, Lithography, Electron beam lithography, Glasses, Software development, Control systems, Optical lithography, Manufacturing, Actuators, Scanners

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Proceedings Article | 26 March 2013 Paper

0.1-nanometer resolution positioning stage for sub-10 nm scanning probe lithography

Nataliya Vorbringer-Doroshovets, Felix Balzer, Roland Fuessl, Eberhard Manske, Marcus Kaestner, Andreas Schuh, Jens-Peter Zoellner, Manuel Hofer, Elshad Guliyev, Ahmad Ahmad, Tzvetan Ivanov , Ivo Rangelow

Proceedings Volume 8680, 868018 (2013) https://doi.org/10.1117/12.2012324

KEYWORDS: Scanning probe lithography, Lithography, Atomic force microscopy, Nanoelectronics, Optical lithography, Silicon, Inspection, Scanners, Optical alignment, Photomasks

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Proceedings Article | 26 March 2013 Paper

Scanning probe lithography approach for beyond CMOS devices

Zahid Durrani, Mervyn Jones, Marcus Kaestner, Manuel Hofer, Elshad Guliyev, Ahmad Ahmad, Tzvetan Ivanov, Jens-Peter Zoellner, Ivo Rangelow

Proceedings Volume 8680, 868017 (2013) https://doi.org/10.1117/12.2012199

KEYWORDS: Lithography, Silicon, Scanning probe lithography, Electrons, CMOS technology, CMOS devices, Nanoelectronics, Nanotechnology, Nanolithography, Nanocrystals

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Showing 5 of 12 publications

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