Andre Xiao
at Hangzhou Cobetter Filtration Equipment Co. Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 22 February 2021 Presentation + Paper
Andre Xiao, Kalon Ke, Yoshiaki Yamada
Proceedings Volume 11612, 116120G (2021) https://doi.org/10.1117/12.2580109
KEYWORDS: Metals, Lithography, Photoresist developing, Photoresist materials, Iron, Chemically amplified resists, Thin film coatings, System on a chip, Semiconductors, Semiconductor manufacturing

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