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Dr. Anthony Engler
at Louisiana State Univ
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Author
Publications (1)
Proceedings Article | 9 April 2024 Presentation + Paper
Positive-tone, dry-develop poly(aldehyde) photoresist
Jose Lopez Ninantay, Anthony Engler, Jared Schwartz, Paul Kohl
Proceedings Volume 12957, 129570G (2024) https://doi.org/10.1117/12.3010169
KEYWORDS: Photoacid generators, Polymers, Photoresist materials, Lithography, Photoresist developing, Line edge roughness, Film thickness, Plasma, Ultraviolet radiation
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