Ayako Endo
at Toshiba Corp
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | 1 October 2006
JM3, Vol. 5, Issue 04, 043001, (October 2006) https://doi.org/10.1117/12.10.1117/1.2397065
KEYWORDS: Polarization, Photomasks, Transmittance, Chromium, Phase shifts, Lithography, Lithographic illumination, Immersion lithography, Semiconducting wafers, Finite-difference time-domain method

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598458
KEYWORDS: Polarization, Photomasks, Phase shifts, Chromium, Lithography, Lithographic illumination, Semiconducting wafers, Electroluminescence, Transmittance, Tolerancing

SPIE Journal Paper | 1 April 2005
Takashi Sato, Ayako Endo, Tatsuhiko Higashiki, Kazutaka Ishigo, Takuya Kono, Takashi Sakamoto, Yoshiyuki Shioyama, Satoshi Tanaka
JM3, Vol. 4, Issue 02, 023002, (April 2005) https://doi.org/10.1117/12.10.1117/1.1898603
KEYWORDS: Signal processing, Semiconducting wafers, Optical alignment, TCAD, Photomasks, Metals, Computer aided design, Laser ablation, Chemical mechanical planarization, Inspection

SPIE Journal Paper | 1 July 2004
Takashi Sato, Ayako Endo, Koji Hashimoto, Soichi Inoue, Tsuyoshi Shibata, Yuuji Kobayashi
JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759327
KEYWORDS: Semiconducting wafers, Ion implantation, Diffraction, Wafer-level optics, Lithography, Computer simulations, Finite-difference time-domain method, Light sources, Deep ultraviolet, Scanners

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536108
KEYWORDS: Photomasks, Semiconducting wafers, Diffraction, Binary data, Diffractive optical elements, Ions, Lithography, Photoresist processing, Chemical mechanical planarization, Optical lithography

Showing 5 of 8 publications
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