Prof. Bei Yu Profile

Prof. Bei Yu

Assistant Professor at Chinese Univ of Hong Kong

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Author

Publications (21)

Proceedings Article | 10 April 2024 Presentation + Paper

Open-source differentiable lithography imaging framework

Guojin Chen, Hao Geng, Bei Yu, David Pan

Proceedings Volume 12954, 129540J (2024) https://doi.org/10.1117/12.3009980

KEYWORDS: Lithography, Latex, Source mask optimization, Photomasks, Performance modeling, Systems modeling, Computational lithography, Computer programming, Optical lithography, Mathematical optimization

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Proceedings Article | 28 April 2023 Poster + Paper

GPU-accelerated matrix cover algorithm for multiple patterning layout decomposition

Guojin Chen, Haoyu Yang, Bei Yu

Proceedings Volume 12495, 124951P (2023) https://doi.org/10.1117/12.2657904

KEYWORDS: Optical lithography, Design and modelling, Lithography, Computer programming, Algorithm development, Performance modeling, Double patterning technology, Design rules

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Proceedings Article | 20 March 2019 Presentation + Paper

Hotspot detection using squish-net

Haoyu Yang, Piyush Pathak, Frank Gennari, Ya-Chieh Lai, Bei Yu

Proceedings Volume 10962, 109620S (2019) https://doi.org/10.1117/12.2515172

KEYWORDS: Machine learning, Neural networks, Design for manufacturing, Convolution, Model-based design, Charge-coupled devices, Metals, Semiconductor manufacturing, Artificial intelligence, Convolutional neural networks

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SPIE Journal Paper | 24 August 2017

Imbalance aware lithography hotspot detection: a deep learning approach

Haoyu Yang, Luyang Luo, Jing Su, Chenxi Lin, Bei Yu

JM3, Vol. 16, Issue 03, 033504, (August 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033504

KEYWORDS: Lithography, Neural networks, Convolution, Neurons, Machine learning, Photomasks, Performance modeling, Feature extraction, Convolutional neural networks, Sensors

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SPIE Journal Paper | 14 June 2017

Triple/quadruple patterning layout decomposition via linear programming and iterative rounding

Yibo Lin, Xiaoqing Xu, Bei Yu, Ross Baldick, David Pan

JM3, Vol. 16, Issue 02, 023507, (June 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023507

KEYWORDS: Electron beam lithography, Extreme ultraviolet lithography, Computer programming, Lithography, Metals, Semiconductors, Directed self assembly, Manufacturing, Photomasks

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Proceedings Article | 28 March 2017 Presentation + Paper

Imbalance aware lithography hotspot detection: a deep learning approach

Haoyu Yang, Luyang Luo, Jing Su, Chenxi Lin, Bei Yu

Proceedings Volume 10148, 1014807 (2017) https://doi.org/10.1117/12.2258374

KEYWORDS: Neurons, Photomasks, Convolutional neural networks, Sensors, Very large scale integration, Lithography, Convolution, Neural networks, Machine learning, Feature extraction, Data modeling, Design for manufacturing

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SPIE Journal Paper | 21 October 2016

Laplacian eigenmaps- and Bayesian clustering-based layout pattern sampling and its applications to hotspot detection and optical proximity correction

Tetsuaki Matsunawa, Bei Yu, David Pan

JM3, Vol. 15, Issue 04, 043504, (October 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.043504

KEYWORDS: Source mask optimization, Optical proximity correction, Data modeling, Lithography, Feature extraction, Principal component analysis, Model-based design, Performance modeling, Photomasks, Manufacturing

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Proceedings Article | 16 March 2016 Paper

Triple/quadruple patterning layout decomposition via novel linear programming and iterative rounding

Yibo Lin, Xiaoqing Xu, Bei Yu, Ross Baldick, David Pan

Proceedings Volume 9781, 97810M (2016) https://doi.org/10.1117/12.2218628

KEYWORDS: Lithography, Manufacturing, Metals, Semiconductors, New and emerging technologies, Directed self assembly, Silicon carbide

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SPIE Journal Paper | 11 March 2016

Optical proximity correction with hierarchical Bayes model

Tetsuaki Matsunawa, Bei Yu, David Pan

JM3, Vol. 15, Issue 02, 021009, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021009

KEYWORDS: Optical proximity correction, Data modeling, Model-based design, Performance modeling, Statistical modeling, Simulation of CCA and DLA aggregates, Lithography, Feature extraction, Monte Carlo methods, Optics manufacturing

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SPIE Journal Paper | 3 February 2016

Systematic framework for evaluating standard cell middle-of-line robustness for multiple patterning lithography

Brian Cline, Greg Yeric, Bei Yu, David Pan, Xiaoqing Xu

JM3, Vol. 15, Issue 02, 021202, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021202

KEYWORDS: Lithography, Optical lithography, Photomasks, Standards development, Legal, Manufacturing, Logic, Electrochemical etching, Double patterning technology, Algorithms

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SPIE Journal Paper | 7 August 2015

Directed self-assembly cut mask assignment for unidirectional design

Jiaojiao Ou, Bei Yu, Jhih-Rong Gao, David Pan

JM3, Vol. 14, Issue 03, 031211, (August 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031211

KEYWORDS: Photomasks, Lithography, Metals, Manufacturing, Source mask optimization, Computer programming, Electron beam lithography, Binary data, Fourier transforms, Directed self assembly

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Proceedings Article | 18 March 2015 Paper

A new lithography hotspot detection framework based on AdaBoost classifier and simplified feature extraction

Tetsuaki Matsunawa, Jhih-Rong Gao, Bei Yu, David Pan

Proceedings Volume 9427, 94270S (2015) https://doi.org/10.1117/12.2085790

KEYWORDS: Lithography, Feature extraction, Data modeling, Machine learning, Lawrencium, Manufacturing, Detection and tracking algorithms, Design for manufacturing, Calibration, Performance modeling

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Proceedings Article | 18 March 2015 Paper

Optical proximity correction with hierarchical Bayes model

Tetsuaki Matsunawa, Bei Yu, David Pan

Proceedings Volume 9426, 94260X (2015) https://doi.org/10.1117/12.2085787

KEYWORDS: Optical proximity correction, Data modeling, Model-based design, Statistical modeling, Performance modeling, Feature extraction, Simulation of CCA and DLA aggregates, Lithography, Monte Carlo methods, Statistical analysis

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Proceedings Article | 18 March 2015 Paper

A systematic framework for evaluating standard cell middle-of-line (MOL) robustness for multiple patterning

Xiaoqing Xu, Brian Cline, Greg Yeric, Bei Yu, David Pan

Proceedings Volume 9427, 942707 (2015) https://doi.org/10.1117/12.2085918

KEYWORDS: Optical lithography, Standards development, 193nm lithography, Photomasks, Lithography, Double patterning technology, Legal, Logic, Design for manufacturability, Manufacturing

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SPIE Journal Paper | 4 November 2014

Triple patterning lithography layout decomposition using end-cutting

Bei Yu, Subhendu Roy, Jhih-Rong Gao, David Pan

JM3, Vol. 14, Issue 01, 011002, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.14.1.011002

KEYWORDS: Photomasks, Lithography, Optical lithography, Computer programming, Electron beam lithography, Manufacturing, Image processing, Double patterning technology, Logic

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SPIE Journal Paper | 4 November 2014

Accurate lithography hotspot detection based on principal component analysis-support vector machine classifier with hierarchical data clustering

Bei Yu, Jhih-Rong Gao, Duo Ding, Xuan Zeng, David Pan

JM3, Vol. 14, Issue 01, 011003, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.14.1.011003

KEYWORDS: Lithography, Data modeling, Principal component analysis, Calibration, Performance modeling, Manufacturing, Data processing, Computer programming, Data compression, Dimension reduction

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Proceedings Article | 8 October 2014 Paper

Layout compliance for triple patterning lithography: an iterative approach

Bei Yu, Gilda Garreton, David Pan

Proceedings Volume 9235, 923504 (2014) https://doi.org/10.1117/12.2066034

KEYWORDS: Optical lithography, Double patterning technology, Lithography, Electron beam lithography, Photomasks, Computer aided design, Computer programming, Logic, Semiconductors, Extreme ultraviolet

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Proceedings Article | 28 March 2014 Paper

Bridging the gap from mask to physical design for multiple patterning lithography

Bei Yu, Jhih-Rong Gao, Xiaoqing Xu, David Pan

Proceedings Volume 9053, 905308 (2014) https://doi.org/10.1117/12.2048626

KEYWORDS: Optical lithography, Lithography, Photomasks, 193nm lithography, Electron beam lithography, Double patterning technology, Manufacturing, Bridges, Design for manufacturability, Metals

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Proceedings Article | 28 March 2014 Paper

Accurate lithography hotspot detection based on PCA-SVM classifier with hierarchical data clustering

Jhih-Rong Gao, Bei Yu, David Pan

Proceedings Volume 9053, 90530E (2014) https://doi.org/10.1117/12.2045888

KEYWORDS: Data modeling, Lithography, Principal component analysis, Calibration, Machine learning, Performance modeling, Manufacturing, Data processing, Data centers, Design for manufacturing

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Proceedings Article | 29 March 2013 Paper

Triple patterning lithography (TPL) layout decomposition using end-cutting

Bei Yu, Jhih-Rong Gao, David Pan

Proceedings Volume 8684, 86840G (2013) https://doi.org/10.1117/12.2011355

KEYWORDS: Photomasks, Lithography, Electron beam lithography, Computer programming, Bridges, Manufacturing, Extreme ultraviolet lithography, Optical lithography, Logic, Solids

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Proceedings Article | 29 March 2013 Paper

Self-aligned double patterning friendly configuration for standard cell library considering placement impact

Jhih-Rong Gao, Bei Yu, Ru Huang, David Pan

Proceedings Volume 8684, 868406 (2013) https://doi.org/10.1117/12.2011660

KEYWORDS: Double patterning technology, Standards development, Manufacturing, Photomasks, Computer aided design, Antimony, Lithography, Design for manufacturability, Overlay metrology, Process control

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Showing 5 of 21 publications

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