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Chang-Sik Yoo
at SAMSUNG Electronics Co Ltd
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Publications (1)
Proceedings Article | 28 April 2023 Poster + Paper
Layout pattern risk assessment in advanced technology node: methodology for pattern clustering and classification
Jae-Beom Jeon, Su-Min Kim, Se-Il Oh, Dai-Hyun Jung, Hyuck-Joon Kwon, Chang-Sik Yoo, Joo-Young Lee
Proceedings Volume 12495, 1249520 (2023) https://doi.org/10.1117/12.2656589
KEYWORDS: Image classification, Design rules, Advanced patterning, Design and modelling, Design for manufacturing, Tolerancing, Semiconducting wafers, Risk assessment, Lithography, Metals
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