Prof. Chun-Hung Liu Profile

Prof. Chun-Hung Liu

at National Taitung Univ

SPIE Involvement:

Author

Publications (11)

SPIE Journal Paper | 29 July 2021

Investigation on helium ion beam lithography with proximity effect correction

Chien-Lin Lee, Sheng-Wei Chien, Kuen-Yu Tsai, Chun-Hung Liu

JM3, Vol. 20, Issue 03, 033201, (July 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.033201

KEYWORDS: Point spread functions, Helium, Ion beam lithography, Process modeling, Optical lithography, Modulation, Scattering, Laser scattering, Electron beam lithography, Photoresist processing

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Proceedings Article | 19 March 2018 Paper

Mask lithographic performance investigation with computational Monte-Carlo method on advanced mask patterning

Chun-Hung Liu, Shih-Ming Chang, Chia-Hua Chang, Wen Lo, Hsin-Wei Wu, Chien-Cheng Chen, Alex Chen, Shuo-Yen Chou, Ru-Gun Liu

Proceedings Volume 10584, 105841E (2018) https://doi.org/10.1117/12.2302685

KEYWORDS: Photomasks, Vestigial sideband modulation, Monte Carlo methods, Model-based design, Beam shaping, Critical dimension metrology, Electron beam lithography, Lithography, Process modeling, Optical lithography

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Proceedings Article | 28 March 2017 Presentation + Paper

Fabrication of metrology test structures with helium ion beam direct write

Chien-Lin Lee, Sheng-Wei Chien, Sheng-Yung Chen, Chun-Hung Liu, Kuen-Yu Tsai, Jia-Han Li, Bor-Yuan Shew, Chit-Sung Hong, Chao-Te Lee

Proceedings Volume 10145, 1014519 (2017) https://doi.org/10.1117/12.2257989

KEYWORDS: Metrology, Electron beam lithography, Lithography, Helium, Ion beams, Critical dimension metrology, Inspection, Photoresist processing, Optical lithography, Bridges

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Proceedings Article | 2 April 2014 Paper

Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts

Yi-Yeh Yang, Hsuan-Ping Lee, Chun-Hung Liu, Hao-Yun Yu, Kuen-Yu Tsai, Jia-Han Li

Proceedings Volume 9050, 905032 (2014) https://doi.org/10.1117/12.2048683

KEYWORDS: Calibration, Lithography, Scatterometry, Semiconducting wafers, Light scattering, 3D modeling, Diffraction, Scattering, Photoresist processing, Process control

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Proceedings Article | 28 March 2014 Paper

Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly

Hao Yun Yu, Chun-Hung Liu, Yu Tian Shen, Hsuan-Ping Lee, Kuen Yu Tsai

Proceedings Volume 9049, 90492C (2014) https://doi.org/10.1117/12.2046615

KEYWORDS: Line edge roughness, Critical dimension metrology, Electron beam lithography, Lithography, Optical lithography, Transistors, Electrons, Semiconducting wafers, Tolerancing, Directed self assembly

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Proceedings Article | 18 April 2013 Paper

Direct-scatterometry-enabled optical-proximity-correction-model calibration

Chih-Yu Chen, Philip C. W. Ng, Chun-Hung Liu, Yu-Tian Shen, Kuen-Yu Tsai, Jia-Han Li, Jason Shieh, Alek Chen

Proceedings Volume 8681, 86810U (2013) https://doi.org/10.1117/12.2009064

KEYWORDS: Calibration, Lithography, Optical proximity correction, Data modeling, Signal processing, Scatterometry, Process control, Photomasks, Process modeling, Systems modeling

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SPIE Journal Paper | 22 August 2012

New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints

Hoi-Tou Ng, Yu-Tian Shen, Sheng-Yung Chen, Chun-Hung Liu, Philip Ng, Kuen-Yu Tsai

JM3, Vol. 11, Issue 3, 033007, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.033007

KEYWORDS: Electron beam lithography, Monte Carlo methods, Line edge roughness, Computer simulations, Critical dimension metrology, Transistors, Optical simulations, Diffusion, Optimization (mathematics), Point spread functions

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Proceedings Article | 5 April 2012 Paper

Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples

Yu-Tian Shen, Chun-Hung Liu, Chih-Yu Chen, Hoi-Tou Ng, Kuen-Yu Tsai, Fu-Ming Wang, Chieh-Hsiung Kuan, Yen-Min Lee, Hsin-Hung Cheng, Jia-Han Li, Alek Chen

Proceedings Volume 8324, 83242K (2012) https://doi.org/10.1117/12.918109

KEYWORDS: Calibration, Line edge roughness, Scatterometry, Point spread functions, Process modeling, Scanning electron microscopy, Metrology, Scattering, Semiconducting wafers, Cadmium

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SPIE Journal Paper | 13 March 2012

New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography

Chun-Hung Liu, Hoi-Tou Ng, Kuen-Yu Tsai

JM3, Vol. 11, Issue 1, 013009, (March 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.013009

KEYWORDS: Point spread functions, Calibration, Optical lithography, Lithography, Photoresist processing, Optical simulations, Electron beam lithography, Tolerancing, Scattering, Critical dimension metrology

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Proceedings Article | 3 April 2010 Paper

Model-based proximity effect correction for electron-beam direct-write lithography

Chun-Hung Liu, Pei-Lin Tien, Philip C. Ng, Yu-Tian Shen, Kuen-Yu Tsai

Proceedings Volume 7637, 76371V (2010) https://doi.org/10.1117/12.846706

KEYWORDS: Process modeling, Photoresist processing, Modulation, Scattering, Model-based design, Semiconducting wafers, Lithography, Electron beams, Electron beam direct write lithography, Laser scattering

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Proceedings Article | 4 December 2008 Paper

A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography

Chun-Hung Liu, Hoi-Tou Ng, Philip Ng, Kuen-Yu Tsai, Shy-Jay Lin, Jeng-Homg Chen

Proceedings Volume 7140, 71401I (2008) https://doi.org/10.1117/12.804693

KEYWORDS: Monte Carlo methods, Scattering, Electron beam lithography, Silicon, Data modeling, Polymethylmethacrylate, Laser scattering, Direct write lithography, Computer simulations, Backscatter

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Showing 5 of 11 publications

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